Several students, along with Professors Ruzic and Qerimi, went to San Jose, CA to attend the SPIE Advanced Lithography + Patterning conference at the San Jose McEnery Convention Center on February 22 – 26.
The conference’s aim is to allow attendees to learn about new research and challenges in EUV lithography and patterning technologies as well as network and meet others in the field.
Emily Greene gave her talk on the “Investigation of stannane (SnH4) decomposition and sticking coefficient on varied metal surfaces in EUV lithography environments” and Nathan Bartlett gave his on “High energy and thermal transport of tin ions in an extreme ultraviolet lithography source”. Jameson Crouse presented his poster titled “Measurement of Tin Diffusion through Molecular Hydrogen” and Jaime Robertson presented his titled “Measurement of tin particles’ trajectories emitted due to a hydrogen plasma”.