Author: Robert Slater

The Illinois Plasma Institute and Research (IPI) is pleased to announce that graduate student Christian Williams has successfully defended his PhD thesis, marking a significant milestone for both the institute and the broader field of sustainable semiconductor manufacturing. Christian’s dissertation addresses one of the emerging challenges in chip fabrication: the accumulation of difficult-to-remove residues that result from […]

Last week we welcomed the CEO of Tokyo Electron Limited (TEL) to the Illinois Plasma Institute at the University of Illinois Urbana-Champaign. TEL is a long-standing partner of IPI, and our collaboration runs deep, from plasma etch and deposition process R&D to digital twin development for next-generation semiconductor manufacturing tools. Having leadership from one of […]

In a recent announcement from the American Vacuum Society (AVS), Research Assistant Professor Dren Qerimi of the Nuclear, Plasma, and Radiological Engineering (NPRE) department has been honored with the AVS Plasma Science and Technology Division’s Young Investigator Award. The AVS conference took place this week in Charlotte, NC. The prestigious accolade recognizes his significant contributions […]

“The first time I met Dave was in 2008 when I interviewed for a position at UIUC (which I didn’t get, but that’s for another story). Before that, I only knew that he works on plasma/fusion, and nothing else. When we met, it was quickly apparent I was standing in front of a charismatic, enthusiastic, […]

Jeremy Jacob Harry Mettler, a Ph.D. candidate at NPRE/IPI, has successfully passed the preliminary exam on his research on etching-based fluorine radical probes. Mettler’s work focuses on developing and applying novel radical probe designs to achieve spatially resolved measurements of fluorine density in plasma systems, a critical factor in reactive ion etching (RIE) processes. His […]

Illinois Plasma Institute graduate student Christian Williams successfully defended his preliminary exam titled “Plasma-Activated Liquids with Applications to the Semiconductor Industry using the Integrated circuit Manufacturing with Plasma Activated Chemical Treatment (IMPACT) Tool.” This work investigates the potential of atmospheric plasma treatment of a liquid (TMAH) used in semiconductor manufacturing for etching and lithography processes. […]

A focused degree that equips you to lead in semiconductor manufacturing, industrial plasmas, nuclear fusion, and more. Finding solutions to current and future processing challenges requires a mastery of the core concepts of plasma engineering as well as topical depth in a professional focus area.  The M.Eng. in Plasma Engineering is a professionally-oriented masterʼs degree from The […]

IPI Associate Director Dren Qerimi and Professor G. Girolami visited TOK Japan to present their findings and explore further collaboration in transforming novel scientific ideas into products that will empower the semiconductor industry. Additionally, Professor D. Qerimi visited Ebara to discuss the potential of adding Ebara as an IPI partner.

Join us as we celebrate and thank David for his 40 years of service to the Department of Nuclear, Plasma & Radiological Engineering and the University of Illinois Urbana-Champaign. May 2, 2024 | 2:00 – 3:00 p.m.Talbot Lounge (Room 220)

NPRE professor David Ruzic and his Illinois Plasma Institute have been featured in the Fall 2023 issue of Limitless, The Grainger College of Engineering‘s biannual magazine. In the article, Ruzic talks about IPI’s mission to “rethink existing pathways to commercialization of new technologies developed in academic research settings.” Read the story here: https://grainger.illinois.edu/…/illinois-plasma-institute