Publications – Illinois Plasma Institute

2025

Gianluca Panici, John R. Spoore, Dren Qerimi, Md. Amzad Hossain, David N. Ruzic, “Multiple distinct plasmas in extreme ultraviolet lithography sources,” J. Micro/Nanopattern. Mats. Metro. 24(3) 033801 (9 September 2025) https://doi.org/10.1117/1.JMM.24.3.033801
Parker Hays, Dhruval Patel, Michael Stowell, Dren Qerimi, David Ruzic; Evolution of graphene nanoflake size and morphology in atmospheric pressure microwave plasma. J. Vac. Sci. Technol. B 1 July 2025; 43 (4): 042801. https://doi.org/10.1116/6.0004741

David Graves, Catherine Labelle, Mark Kushner, Eray Aydil, Vincent M Donnelly, Jane Chang, Peter Mayer, L. Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic, “Science Challenges and Research Opportunities for Plasma Applications in Microelectronics”, Journal of Vacuum Science and Technology B, March 21, 2024 (Accepted for Publication).
Nicholas Connolly, Michael Hysick, David E. Barlaz, Raquel Garza, Gilberto Lunardi, David N. Ruzic, “Characterization of elastomer degradation in O₂/Ar plasma via mass and surface morphology changes”, Journal of Vacuum Science and Technology A, Vol. 42, 023004, 2024.

Gianluca Panici and David N. Ruzic, “Tin Mitigation in EUV Sources”, Chapter 18, Photon Sources for Lithography and Metrology edited by Vivek Bakshi, SPIE, Washington, 2023.
Rquel Garza, Nathan Bartlett, Jameson Crouse, Andrew Herschberg, R. Mohan Sankaran, Md. Amzad Hossain, David N. Ruzic, “Stannane in extreme ultraviolet lithography and vacuum technology” Synthesis and characterization”, Journal of Vacuum Science & Technology A, vol. 41, 063209, 2023.

Huber, W., T. Houlahan, Z. Jeckell, D. Barlaz, I. Haehnlein, B. Jurczyk and D.N. Ruzic, “Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal“, Plasma Sources Science and Technology, Volume 31, Number 6, (2022) 065001. https://doi.org/10.1088/1361-6595/ac6d0a
Jeckell, Z., D. E. Barlaz, T. Houlahan, W. Huber, I. Haehnlein, B. Jurczyk and D. N. Ruzic, “Time-resolved ion energy distribution functions during a HiPIMS discharge with cathode voltage reversal“, Physica Scripta 98, (2022). https://doi.org/10.1088/1402-4896/aca5c7
Qerimi. D, Herschberg AC, Panici. G, Hays. P, Pohlman. T, and Ruzic. DN, “Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source“, Journal of Applied Physics Volume 132, (2022) 113302. https://doi.org/10.1063/5.0094375
Matlis, E.H., T. C. Corke, D. Qerimi and D. Ruzic, “Single Electrode A.C. Plasma Anemometer in High Speed H2 Jet With Background RF Plasma“, AIAA Aviation 2022, (2022). https://doi.org/10.2514/6.2022-3364

Jeckell, Z., Patel, D., Herschberg, A., Choi, T., Barlaz, D., Bonova, L., … Ruzic, D. (2021). Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing”, Surfaces and Interfaces, 23, (2021) 100989. https://doi.org/10.1016/j.surfin.2021.100989
Qerimi, D.,Panici, G., Jain, A., Jacobson, D., & Ruzic, D. N., “Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system”, Journal of Vacuum Science & Technology A, 39(2), (2021) 023004. https://doi.org/10.1116/6.0000787
Qerimi, D., Shchelkanov, I., Panici, G., Jain, A., Wagner, J., & Ruzic, D. N., “Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen”, Journal of Vacuum Science & Technology A, 39(2), (2021) 023003. https://doi.org/10.1116/6.0000786
Patel, D., L. Bonova, Z. Jeckell, D. Barlaz, S. Chaudhuri, D. Krogstad, and Ruzic, D. “Deposition of Zirconium Oxide using Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition with Various Precursors”, Thin Solid Films, 733, (2021), 138815. https://doi.org/10.1016/j.tsf.2021.138815

Dren Querimi, Gianluca Panici, Arihant Jain, Daniel Jacobson, David N. Ruzic, Study of a Linear Surface Wave Plasma Source for Tin removal in an extreme ultraviolet source”, 00331 Journal of vacuum science and technology B (2020) DOI: 10.1116/6.0000200
Lucia Bonova, Weikun Zhu, Dhruval K. Patel, Daniel V. Krogstad and David N. Ruzic, Atmospheric pressure microwave plasma for aluminum surface cleaning”, Journal of Vacuum Science Technology A 38, 023002 (2020) https://doi.org/10.1116/1.5132912

Jan Uhlig, David E. Barlaz, David N. Ruzic, “Reduction in a-Si:H density utilizing a secondary plasma”, J. Micro/Nanolithography, MEMS and MOEMS 18(4), 044502 (2019), doi: 10.1117/1.JMM.18.4.044502.
Chisung Ahn, John Gill and David N. Ruzic, “Growth of Plasma-Treated Corn Seeds Under Realistic Conditions – 2019“, Nature Scientific Reports 9, 4355 (2019)

Jake McLain, Priya Raman, Dhruval Patel, Randall Spreadbury, Jan Uhlig, Ivan Shchelkanov, D.N. Ruzic, “Linear magnetron HiPIMS high deposition rate magnet pack” Vacuum, Volume 155, Page 559-565 (2018)
Priya Raman, Matthew Cheng, Justin Weberski, Wenyu Xu, Thomas Houlahan, Jose Rivera, Rui Su, Ivan Shchelkanov, David Ruzic, “Magnetic Field Influence on Ionization Zones in High-Power Impulse Magnetron Sputtering” Vacuum, Volume 156, Page 9-19 (2018)
S. Hammouti , B. Holybee, M. Christenson, M. Szott, K. Kalathiparambil, S. Stemmley, B. Jurczyk, D.N. Ruzic, “Wetting of liquid lithium on fusion-relevant materials microtextured by femtosecond laser exposure” Journal of Nuclear Materials, Volume 508, Page 237-248 (2018)
B. Wu, Y. Yu, J. Wu, I. Shchelkanov, D.N. Ruzic, N. Huang, Y.X. Leng, “Tailoring of titanium thin film properties in high power pulsed magnetron sputtering” Vacuum, Volume 150, Page 144-154 (2018)
W.K. Zhu, K.K. Kalathiparambil, Z.G. Sun, C.Y. Liu, A.M. Zhu, D.N. Ruzic, “Enhanced Effect of a Plasma-Irradiated Titanium Substrate on the Photocatalytic Activity of a TiO2 Film” Plasma Processes and Polymers, Volume 15, Issue 5, Page 1700223 (2018)
B. Wu, I. Haehnlein, I. Shchelkanov, J. McLain, D. Patel, J. Uhlig, B. Jurczyk, Y. Leng, D. N. Ruzic, “Cu films prepared by bipolar pulsed high power impulse magnetron sputtering” Vacuum, Volume 150, Page 216-221 (2018)

Q. Yang, K. Kalathiparambil, D.T. Elg, D. Ruzic, W.M. Krivem, “Microstructural damage of α-Al2O3 by high energy density plasma” Acta Materialia, Volume 132, Page 479-490 (2017)
D.T. Elg, G.A. Panici, J.A. Peck, S.N. Srivastava, D.N. Ruzic, “Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 16, Number 2, Page 023501 (2017)
J.A. Peck, P. Zonooz, D. Curreli, G.A. Panici, B.E. Jurczyk, D.N. Ruzic, “High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source” Surface and Coating Technology, Volume 325, Page 370-376 (2017)
D.T. Elg, G.A. Panici, S. Liu, G. Girolami, S.N. Srivastava, D.N. Ruzic, “Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching” Plasma Chemistry and Plasma Processing, Volume 38, Issue 1, Page 223-245 (2017)
J.A. Peck and D.N. Ruzic, “Mechanism behind dry etching of Si assisted by pulsed visible laser” Journal of Applied Physics, Volume 122, Issue 17, Page 173304 (2017)
J.A. Peck and D.N. Ruzic, “Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption” Journal of Vacuum Science & Technology A, Volume 36, Issue 2, Page 021301 (2017)