2021

• Jeckell, Z., Patel, D., Herschberg, A., Choi, T., Barlaz, D., Bonova, L., … Ruzic, D. (2021). Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing”, Surfaces and Interfaces, 23, (2021) 100989. https://doi.org/10.1016/j.surfin.2021.100989
• Qerimi, D.,Panici, G., Jain, A., Jacobson, D., & Ruzic, D. N., “Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system”, Journal of Vacuum Science & Technology A, 39(2), (2021) 023004. https://doi.org/10.1116/6.0000787
• Qerimi, D., Shchelkanov, I., Panici, G., Jain, A., Wagner, J., & Ruzic, D. N., “Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen”,  Journal of Vacuum Science & Technology A, 39(2), (2021) 023003. https://doi.org/10.1116/6.0000786
• Patel, D., L. Bonova, Z. Jeckell, D. Barlaz, S. Chaudhuri, D. Krogstad, and Ruzic, D. “Deposition of Zirconium Oxide using Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition with Various Precursors”, Thin Solid Films, 733, (2021), 138815. https://doi.org/10.1016/j.tsf.2021.138815

2020

• Dren Querimi, Gianluca Panici,  Arihant Jain, Daniel Jacobson, David N. Ruzic, Study of a Linear Surface Wave Plasma Source for Tin removal in an extreme ultraviolet source”, 00331 Journal of vacuum science and technology B (2020)  DOI: 10.1116/6.0000200
• Lucia Bonova, Weikun Zhu, Dhruval K. Patel, Daniel V. Krogstad and David N. Ruzic, Atmospheric pressure microwave plasma for aluminum surface cleaning”, Journal of Vacuum Science Technology A 38, 023002 (2020)    https://doi.org/10.1116/1.5132912

2019

• Jan Uhlig, David E. Barlaz, David N. Ruzic,  “Reduction in a-Si:H density utilizing a secondary plasma”, J. Micro/Nanolithography, MEMS and MOEMS 18(4), 044502 (2019), doi: 10.1117/1.JMM.18.4.044502.
  Chisung Ahn, John Gill and David N. Ruzic, “Growth of Plasma-Treated Corn Seeds Under Realistic Conditions – 2019“, Nature Scientific Reports 9, 4355 (2019)

2018

• Jake McLain, Priya Raman, Dhruval Patel, Randall Spreadbury, Jan Uhlig, Ivan Shchelkanov, D.N. Ruzic, “Linear magnetron HiPIMS high deposition rate magnet pack” Vacuum, Volume 155, Page 559-565 (2018)
• Priya Raman, Matthew Cheng, Justin Weberski, Wenyu Xu, Thomas Houlahan, Jose Rivera, Rui Su, Ivan Shchelkanov, David Ruzic, “Magnetic Field Influence on Ionization Zones in High-Power Impulse Magnetron Sputtering” Vacuum, Volume 156, Page 9-19 (2018)
• S. Hammouti , B. Holybee, M. Christenson, M. Szott, K. Kalathiparambil, S. Stemmley, B. Jurczyk, D.N. Ruzic, “Wetting of liquid lithium on fusion-relevant materials microtextured by femtosecond laser exposure” Journal of Nuclear Materials, Volume 508, Page 237-248 (2018)
• B. Wu, Y. Yu, J. Wu, I. Shchelkanov, D.N. Ruzic, N. Huang, Y.X. Leng, “Tailoring of titanium thin film properties in high power pulsed magnetron sputtering” Vacuum, Volume 150, Page 144-154 (2018)
• W.K. Zhu, K.K. Kalathiparambil, Z.G. Sun, C.Y. Liu, A.M. Zhu, D.N. Ruzic, “Enhanced Effect of a Plasma-Irradiated Titanium Substrate on the Photocatalytic Activity of a TiO2 Film” Plasma Processes and Polymers, Volume 15, Issue 5, Page 1700223 (2018)
• B. Wu, I. Haehnlein, I. Shchelkanov, J. McLain, D. Patel, J. Uhlig, B. Jurczyk, Y. Leng, D. N. Ruzic, “Cu films prepared by bipolar pulsed high power impulse magnetron sputtering” Vacuum, Volume 150, Page 216-221 (2018)

2017

• Q. Yang, K. Kalathiparambil, D.T. Elg, D. Ruzic, W.M. Krivem, “Microstructural damage of α-Al2O3 by high energy density plasma” Acta Materialia, Volume 132, Page 479-490 (2017)
• D.T. Elg, G.A. Panici, J.A. Peck, S.N. Srivastava, D.N. Ruzic, “Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 16, Number 2, Page 023501 (2017)
• J.A. Peck, P. Zonooz, D. Curreli, G.A. Panici, B.E. Jurczyk, D.N. Ruzic, “High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source” Surface and Coating Technology, Volume 325, Page 370-376 (2017)
• D.T. Elg, G.A. Panici, S. Liu, G. Girolami, S.N. Srivastava, D.N. Ruzic, “Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching” Plasma Chemistry and Plasma Processing, Volume 38, Issue 1, Page 223-245 (2017)
• J.A. Peck and D.N. Ruzic, “Mechanism behind dry etching of Si assisted by pulsed visible laser” Journal of Applied Physics, Volume 122, Issue 17, Page 173304 (2017)
• J.A. Peck and D.N. Ruzic, “Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption” Journal of Vacuum Science & Technology A, Volume 36, Issue 2, Page 021301 (2017)